Through Stack 3D Metrology

On-demand webinar

The ability to measure and characterize high-aspect-ratio devices has become critical in the development of complex semiconductor memory structures.

 

In this webinar, we explore how the Thermo Scientific Helios 5 PXL Wafer DualBeam provides deep structural insights to high-aspect-ratio memory devices with its plasma FIB milling capabilities and high-resolution SEM imaging.

 

Learn how an automated in-fab workflow can provide rapid access to critical data and significantly accelerate development and yield learning processes.

Submit the form below to watch:


I would like to:

Tell us more about your interest timeline:

Email Permissions

To comply with your preferences, we need to confirm permission to send you communications by email. Personal information provided will be used in accordance with our Privacy Policy.